X-ray Scattering & X-ray Diffraction

Structural Characterisation of thin films, interfaces and nanostructures

Applications of X-ray scattering and diffraction at IPS are concerned  with the characterisation of thin films, interfaces and nanostructures in electronic, functional and engineering materials. Such materials play an important role in modern technology – layers of only a few nanometers thickness form the basis of state-of-the-art high-density integrated chip fabrication, while thin films of materials such as carbides or nitrides, with thicknesses of only several tens of nanometers, provide corrosion and temperature resistance for mechanical structures such as aircraft turbine blades. 

Of particular interest is the elucidation of nanoscale structural information during materials processing, for example: 

  • in situ observation of structure formation during growth processes
  • operando analysis of material processing/cycling
  • multi-scale resolution (atomic to nanoscale, correlation to macroscale) and methodical combination

Methods and techniques include:

  • High-resolution X-ray diffraction (HRXRD)
  • X-ray Reflection (XRR)
  • Grazing-incidence small-angle scattering (GISAXS)
  • Grazing incidence X-ray diffraction (GID)
  • Reciprocal Space Mapping

both at the NANO beamline at the KIT Synchrotron and at other leading synchrotron sources.