The IPS UHV (ultra-high vacuum) Analysis lab is a facility for in-situ growth studies combining a modular and extendable UHV cluster system for complementary surface analytics with several UHV growth chambers for in situ X-ray experiments during thin film and nanostructure formation.
The UHV cluster is a large ultra-high vacuum transfer system offering several docking stations for portable and stationary growth chambers. Samples with a maximum size of 25 mm can be inserted directly via three loadlocks. The central analysis and surface preparation chambers are accessible from all growth chambers. Here, samples can be prepared by Argon sputtering (limited to a surface area of 10x10 mm2) and annealing. They can be analyzed by standard surface characterization methods such as:
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UHV cluster comprising several deposition and surface analysis chambers.
The UHV cluster is an extendable facility which can be developed to meet the demands of future experiments. |